共 8 条
[2]
DRASTIC CHANGE IN CF-2 AND CF-3 KINETICS INDUCED BY HYDROGEN ADDITION INTO CF-4 ETCHING PLASMA
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS,
1993, 32 (5A)
:L690-L693
[3]
Enhancement of surface productions of CFx radicals by the addition of H2 into CF4 plasmas
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS,
1999, 38 (8B)
:L954-L957
[6]
Surface productions of CF and CF2 radicals in high-density fluorocarbon plasmas
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1998, 16 (04)
:2222-2226
[7]
Loss processes of F atoms in low-pressure, high-density CF4 plasmas with the admixture of H2
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS,
1999, 38 (7B)
:4373-4376
[8]
YANEV RK, 1987, ELEMENTARY PROCESSES