Application of scanning tunneling microscopy nanofabrication process to single electron transistor

被引:35
作者
Matsumoto, K
Ishii, M
Segawa, K
机构
[1] Electrotechnical Laboratory MITI, Ibaraki-ken
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1996年 / 14卷 / 02期
关键词
D O I
10.1116/1.589091
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The single electron transistor was fabricated by quite a new fabrication process using scanning tunneling microscopy, The single electron transistor operates at room temperature showing a clear Coulomb staircase of 150 mV periods. The tip of the scanning tunneling microscope was used as a cathode, and the surface of the Ti layer was oxidized to form a narrow oxidized Ti line. Using this oxidized Ti line, the island region of the single electron transistor was fabricated. The electrical property of the oxidized Ti line was also examined in detail. (C) 1996 American Vacuum Society.
引用
收藏
页码:1331 / 1335
页数:5
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