Transient sheath in a cylindrical bore for finite-rise-time voltage pulses

被引：20

作者：

Sheridan, TE

机构：

[1] Department of Physics, West Virginia University, Morgantown

来源：

SURFACE & COATINGS TECHNOLOGY | 1996年 / 85卷 / 03期

关键词：

plasma-based ion implantation; cylindrical bores; plasma sheath;

D O I：

10.1016/0257-8972(96)02858-7

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A model predicting the evolution of the sheath in a plasma-filled cylindrical bore for finite-rise-time voltage pulses is presented. It is found that the maximum ion impact energy and the proportion of energetic ions decrease as the pulse rise time increases. For applications in which it is desirable to maximize the ion impact energy (e.g., plasma-based ion implantation), shorter rise times are better.

引用

页码：204 / 208

页数：5

共 9 条

[1] APPLICATION OF PARTICLE-IN-CELL SIMULATION TO PLASMA SOURCE ION-IMPLANTATION [J].