PULSED-SHEATH ION DYNAMICS IN A TRENCH

被引：40

作者：

SHERIDAN, TE

机构：

[1] Department of Physics, West Virginia University, Morgantown, WV

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1995年 / 28卷 / 06期

关键词：

D O I：

10.1088/0022-3727/28/6/011

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Plasma ion dynamics following the application of a negative voltage pulse to a two-dimensional trench geometry are computed using a two-fluid model. The potential structure in the sheath both focuses and bunches ions, creating an ion density pulse that travels down the sidewall of the trench. It may be possible to exploit this phenomenon to improve ion implantation in the sidewalls of trenches and holes when using plasma source ion implantation.

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收藏

页码：1094 / 1098

页数：5

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