共 46 条
[1]
BOFFARD J, COMMUNICATION
[2]
Measurement of electron-impact excitation cross sections out of metastable levels of argon and comparison with ground-state excitation
[J].
PHYSICAL REVIEW A,
1999, 59 (04)
:2749-2763
[3]
BOGDANOVA IP, 1987, OPT SPEKTROSK+, V62, P34
[4]
Measurement of electron-impact excitation into the 3p54p levels of argon using Fourier-transform spectroscopy
[J].
PHYSICAL REVIEW A,
1998, 57 (01)
:267-277
[6]
Ill-nitride dry etching: Comparison of inductively coupled plasma chemistries
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1999, 17 (04)
:2202-2208
[7]
Analysis of the etching of silicon in an inductively coupled chlorine plasma using laser thermal desorption
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1997, 15 (06)
:3024-3031
[8]
Transient plasma-induced emission analysis of laser-desorbed species during Cl2 plasma etching of Si
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
2000, 18 (06)
:2669-2679
[9]
ELECTRON IMPACT EXCITATION OF ARGON-II LINES
[J].
JOURNAL OF PHYSICS PART B ATOMIC AND MOLECULAR PHYSICS,
1971, 4 (04)
:483-&