OPTICAL-EMISSION SPECTROSCOPY OF REACTIVE PLASMAS - A METHOD FOR CORRELATING EMISSION INTENSITIES TO REACTIVE PARTICLE DENSITY

被引：866

作者：

COBURN, JW

CHEN, M

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1980年 / 51卷 / 06期

关键词：

D O I：

10.1063/1.328060

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3134 / 3136

页数：3

共 8 条

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[7] PLASMA ETCHING IN INTEGRATED-CIRCUIT MANUFACTURE - REVIEW [J].

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WINTERS H, UNPUBLISHED

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