OPTICAL DETECTOR TO MONITOR PLASMA ETCHING

被引：16

作者：

HARSHBARGER, WR

PORTER, RA

NORTON, P

机构：

来源：

JOURNAL OF ELECTRONIC MATERIALS | 1978年 / 7卷 / 03期

关键词：

D O I：

10.1007/BF02655647

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：429 / 440

页数：12

共 14 条

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[4] DRY PROCESS TECHNOLOGY (REACTIVE ION ETCHING) [J].

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APPLIED SPECTROSCOPY, 1977, 31 (01) :40-42

[7] SPECTROSCOPIC STUDY OF RADIOFREQUENCY OXYGEN PLASMA STRIPPING OF NEGATIVE PHOTORESISTS .1. ULTRAVIOLET-SPECTRUM [J].

DEGENKOLB, EO ;

MOGAB, CJ ;

GOLDRICK, MR ;

GRIFFITHS, JE .

APPLIED SPECTROSCOPY, 1976, 30 (05) :520-527

[8]

GRIFFITHS JHE, UNPUBLISHED

[9] STUDY OF OPTICAL EMISSION FROM AN RF PLASMA DURING SEMICONDUCTOR ETCHING [J].

HARSHBARGER, WR ;

PORTER, RA ;

MILLER, TA ;

NORTON, P .

APPLIED SPECTROSCOPY, 1977, 31 (03) :201-207

[10]

KUMAR R, 1976, SOLID STATE TECHNOL, V19, P60

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