Band-offset trends in nitride heterojunctions

被引:40
作者
Binggeli, N
Ferrara, P [1 ]
Baldereschi, A
机构
[1] Ecole Polytech Fed Lausanne, Inst Phys Appl, PHB Ecublens, CH-1015 Lausanne, Switzerland
[2] Inst Phys Appl, CH-1015 Lausanne, Switzerland
[3] Inst Romand Rech Numer Phys Mat, CH-1015 Lausanne, Switzerland
[4] Univ Trieste, Dipartimento Fis Teor, I-34014 Trieste, Italy
[5] Univ Trieste, INFM, I-34014 Trieste, Italy
来源
PHYSICAL REVIEW B | 2001年 / 63卷 / 24期
关键词
D O I
10.1103/PhysRevB.63.245306
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
From first principles we have examined the band offsets of selected zinc-blende, wurtzite, and mixed zinc-blende/wurtzite GaN/AlN, GaN/SiC, and AlN/SiC heterostructures, and their dependence on various structural and chemical properties of the interfaces. Contrary to the case of the conventional, small-gap, semiconductor heterojunctions, local atomic interfacial relaxation has a major influence on the offsets of the polar heterovalent nitride systems. However, provided this effect is taken into account, the band-offset dependence on interface orientation, strain, and heterovalency can still be qualitatively explained using linear-response-theory schemes. We also show that a change in the band-gap discontinuity resulting from a cubic (111) to hexagonal (0001) polytype transformation in nitride heterostructures will be selectively found in the conduction-band offset.
引用
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页数:13
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