Analysis of the etching behavior of ZnO ceramics

被引：44

作者：

Jo, W ^{[1
]}

Kim, SJ

Kim, DY

机构：

[1] Seoul Natl Univ, Sch Mat Sci & Engn, Seoul 151744, South Korea

[2] Seoul Natl Univ, Ctr Microstruct Sci Mat, Seoul 151744, South Korea

来源：

ACTA MATERIALIA | 2005年 / 53卷 / 15期

关键词：

ZnO; etching pattern; microstructure final; crystallographic analysis;

D O I：

10.1016/j.actamat.2005.05.017

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

ZnO ceramics doped with a small amount of Bi2O3 and Sb2O3 were prepared and their orientation-dependent etching patterns were analyzed. Three distinctive patterns produced by the oxidizing etchant HCl were observed: hexagonal etch pits on +C plane, triangular etch pits on prismatic plane, and hillocks of hexagonal pyramid on -C plane. From these results, the three-dimensional shape of etch pit could be suggested. The character of inversion boundary was also determined from the etching patterns. (c) 2005 Acta Meterialia Inc. Published by Elsevier Ltd. All rights reserved.

引用

页码：4185 / 4188

页数：4

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