Ultraviolet radiation induced degradation of poly-para-xylylene (parylene) thin films

被引:42
作者
Fortin, JB [1 ]
Lu, TM
机构
[1] Rensselaer Polytech Inst, Engn Sci Prog, Troy, NY 12180 USA
[2] Rensselaer Polytech Inst, Dept Phys Appl Phys & Astron, Troy, NY 12180 USA
[3] Rensselaer Polytech Inst, Ctr Integrated Elect & Elect Mfg, Troy, NY 12180 USA
关键词
polymers; radiation damage; electrical properties and measurements; optical properties;
D O I
10.1016/S0040-6090(01)01355-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The effect of ultraviolet (UV) radiation of lambda greater than or equal to 250 nm on the thermal stability, electrical and optical properties of thin poly-para-xylylene (parylene) thin films was studied. Evidence of slight oxidation of the UV treated film was seen using Fourier-transform infrared spectroscopy. Thermal desorption spectrometry and thickness change after annealing were used to analyze the thermal stability of as-deposited and UV-treated parylene thin films. The thermal stability of the UV treated films was seen to decease as the radiation dose increased. Electrical measurements revealed an increase in the leakage current density, the dielectric constant and the dissipation factor of UV treated films. No change was seen in the refractive index at 634 mn. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:223 / 228
页数:6
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