Growth of iron single crystals in the etched ion tracks of polymer foils

被引：20

作者：

Dobrev, D ^{[1
]}

Vetter, J ^{[1
]}

Angert, N ^{[1
]}

Neumann, R ^{[1
]}

机构：

[1] Gesell Schwerionenforsch mbH, GSI, D-64291 Darmstadt, Germany

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2001年 / 72卷 / 06期

关键词：

D O I：

10.1007/s003390100872

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Pulse reverse electrolysis in an ultrasonic field is used to grow iron single crystals of micron size in templates formed by etching the tracks of swift ions in polymer foils. High-grade crystals are produced from high-temperature ferrous chloride baths. The crystals are oriented along their < 110 >, < 100 >, and < 111 > crystallographic axes. Their orientation turns out to depend on supersaturation during the growing process. At low overvoltages of deposition, < 110 > and < 100 > orientations are observed. The crystals of < 111 > orientation appear more frequently at higher cathode pulse current density. The crystals possess prominent resistance to corrosion.

引用

页码：729 / 733

页数：5

共 37 条

[11]

DOBREV D, 1995, GSI SCI REPORT 1994, P201

[12]

GIMBERG AM, 1987, GALVANOTECHNIKA

[13] FORMATION OF TEXTURE IN VACUUM-CONDENSED TIN ON GLASS [J].

GRANTSCHAROVA, E ;

DOBREV, D .

THIN SOLID FILMS, 1988, 161 :213-221

[14]

KAWAI S, 1987, S ELECTROCHEMICAL TE, P389

[15]

KOCHERGIN SM, 1964, ELECTRODEPOSITION ME

[16] STRUCTURE OF SILVER ELECTRODEPOSITS PLATED FROM DIFFERENT COMPLEX ELECTROLYTES [J].

KRISTEV, I ;

NIKOLOVA, M .

JOURNAL OF APPLIED ELECTROCHEMISTRY, 1986, 16 (05) :703-706

[17]

KRISTEV I, 1974, KRIST TECH, V1, P9

[18]

KRISTEV I, 1977, SURF TECHNOL, V1, P13

[19]

KRISTEV I, 1977, SURF TECHNOL, V1, P1

[20]

Lowenheim F.A., 1974, Modern Electroplating

← 1 2 3 4 →