Investigations on the long time Behavior of the metastable Boron-Oxygen complex in crystalline silicon

被引:148
作者
Herguth, A. [1 ]
Schubert, G. [2 ]
Kaes, M. [1 ]
Hahn, G. [1 ,3 ]
机构
[1] Univ Konstanz, Dept Phys, D-78457 Constance, Germany
[2] Sunways AG, D-78467 Constance, Germany
[3] Fraunhofer Inst Solar Energy Syst ISE, D-79110 Freiburg, Germany
来源
PROGRESS IN PHOTOVOLTAICS | 2008年 / 16卷 / 02期
关键词
silicon; Czoehralsici; degradation; lifetime; boron-oxygen; defect;
D O I
10.1002/pip.779
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Boron and oxygen contamination in Czochralski-grown (Q) silicon leads to a degradation of the minority charge carrier lifetime within short times due to the formation of recombination active complexes. The formation of these complexes is investigated for longer times showing a further development of the defect. This development called 'regeneration' is triggered by illumination or appliedforward voltages and leads to a new state of the defect. This new state of the defect is proven to be less recombination active allowing higher stable minority carrier lifetimes and conversion efficiencies of solar cells. The influences of temperature and light intensity are discussed. Copyright (c) 2007 John Wiley & Sons, Ltd.
引用
收藏
页码:135 / 140
页数:6
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