Strain energy driven and curvature driven grain boundary migration in 3D-IC Cu vias

被引:1
作者
Awo-Affouda, Chaffra A. [1 ]
Bloomfield, Max O. [1 ]
Cale, Timothy S. [1 ]
机构
[1] Rensselaer Polytech Inst, Troy, NY 12180 USA
来源
SISPAD 2007: SIMULATION OF SEMICONDUCTOR PROCESSES AND DEVICES 2007 | 2007年
关键词
D O I
10.1007/978-3-211-72861-1_10
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We use grain-focused models to study grain boundary (GB) migration (GBM) in polycrystalline Cu vias that interconnect MLM layers in 3D ICs. Curvature-driven GB velocities are calculated by PLENTE [1-3] using the local mean curvature of the GBs, as described in Ref. 2. We use Comsol Multiphysics [4] to calculate GB velocities due to thermally induced strain energy jumps across GBs [5]. The thermo-mechanical calculations needed for this are made using model structures that combine continuum models and grain-continuum (GC) models (see [1-3, 5]); we call these 'hybrid' grain-continuum (HGC) models. Curvature driven GB dominates in this work; however, there are uncertainties in the absolute stress values used and how the relative magnitudes of these phenomena will change as the structure evolves.
引用
收藏
页码:41 / 44
页数:4
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