Mass spectrometric investigations on CH4 plasmas obtained from a dual electron cyclotron resonance-radio frequency discharge

被引:29
作者
Zarrabian, M [1 ]
Leteinturier, C [1 ]
Turban, G [1 ]
机构
[1] Univ Nantes, Lab Plasmas & Couches Minces, Inst Mat Nantes, UMR 6502,CNRS, F-44322 Nantes 03, France
关键词
D O I
10.1088/0963-0252/7/4/018
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Diamond-like carbon (DLC) thin films have been prepared by chemical vapour deposition assisted by electron cyclotron resonance (ECR) plasma of methane at low pressure. with radio frequency (RF) power applied to the substrate. This paper is focused on the plasma diagnostic investigations by mass spectrometry in terms of neutral and ionic populations. ion energy distribution of different species is also presented and the influence of ECR and/or RF excitations on the energy of ion bombardment is studied. The role of different ionic or neutral species in the growth mechanism and in the formation of nanocrystalline clusters in an amorphous matrix, as observed in a previous study by transmission electron microscopy and electron energy loss spectroscopy, is discussed here.
引用
收藏
页码:607 / 616
页数:10
相关论文
共 39 条
[1]   ELECTRON-IMPACT IONIZATION AND DISSOCIATIVE IONIZATION OF THE CD3 AND CD2 FREE-RADICALS [J].
BAIOCCHI, FA ;
WETZEL, RC ;
FREUND, RS .
PHYSICAL REVIEW LETTERS, 1984, 53 (08) :771-774
[2]   TOTAL AND PARTIAL ELECTRON COLLISIONAL IONIZATION CROSS-SECTIONS FOR CH4, C2H6, SIH4, AND SI2H6 [J].
CHATHAM, H ;
HILS, D ;
ROBERTSON, R ;
GALLAGHER, A .
JOURNAL OF CHEMICAL PHYSICS, 1984, 81 (04) :1770-1777
[3]   Influence of ion energy and substrate temperature on the optical and electronic properties of tetrahedral amorphous carbon (ta-C) films [J].
Chhowalla, M ;
Robertson, J ;
Chen, CW ;
Silva, SRP ;
Davis, CA ;
Amaratunga, GAJ ;
Milne, WI .
JOURNAL OF APPLIED PHYSICS, 1997, 81 (01) :139-145
[4]   Radical and film growth kinetics in methane radio-frequency glow discharges [J].
Dagel, DJ ;
Mallouris, CM ;
Doyle, JR .
JOURNAL OF APPLIED PHYSICS, 1996, 79 (11) :8735-8747
[5]   A SIMPLE-MODEL FOR THE FORMATION OF COMPRESSIVE STRESS IN THIN-FILMS BY ION-BOMBARDMENT [J].
DAVIS, CA .
THIN SOLID FILMS, 1993, 226 (01) :30-34
[6]   PROPERTIES OF FILTERED-ION-BEAM-DEPOSITED DIAMOND-LIKE CARBON AS A FUNCTION OF ION ENERGY [J].
FALLON, PJ ;
VEERASAMY, VS ;
DAVIS, CA ;
ROBERTSON, J ;
AMARATUNGA, GAJ ;
MILNE, WI ;
KOSKINEN, J .
PHYSICAL REVIEW B, 1993, 48 (07) :4777-4782
[7]   Etch product identification during CH4-H-2 RIE of InP using mass spectrometry [J].
Feurprier, Y ;
Cardinaud, C ;
Grolleau, B ;
Turban, G .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1997, 6 (04) :561-568
[8]   PLASMA DEPOSITION OF HYDROGENATED AMORPHOUS-CARBON - GROWTH-RATES, PROPERTIES AND STRUCTURES [J].
FOURCHES, N ;
TURBAN, G .
THIN SOLID FILMS, 1994, 240 (1-2) :28-38
[9]   Modeling of surface processes as exemplified by hydrocarbon reactions [J].
Garrison, BJ ;
Kodali, PBS ;
Srivastava, D .
CHEMICAL REVIEWS, 1996, 96 (04) :1327-1341
[10]   COMPARISON OF ADVANCED PLASMA SOURCES FOR ETCHING APPLICATIONS .3. ION ENERGY-DISTRIBUTION FUNCTIONS FOR A HELICON AND A MULTIPOLE ELECTRON-CYCLOTRON-RESONANCE SOURCE [J].
GIBSON, GW ;
SAWIN, HH ;
TEPERMEISTER, I ;
IBBOTSON, DE ;
LEE, JTC .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (04) :2333-2341