Chemically nanopatterned surfaces using polyelectrolytes and ultraviolet-cured hard molds

被引：64

作者：

Park, J

Kim, YS

Hammond, PT

机构：

[1] Ewha Womans Univ, Div Nano Sci, Seoul 120750, South Korea

[2] Ewha Womans Univ, Dept Chem, Seoul 120750, South Korea

[3] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA

[4] MIT, Dept Chem Engn, Cambridge, MA 02139 USA

来源：

NANO LETTERS | 2005年 / 5卷 / 07期

关键词：

D O I：

10.1021/nl050592p

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Polymer transfer printing of poly(acrylic acid) onto a polyelectrolyte multilayer platform resulted in chemically nanopatterned surfaces with well-defined structures and both positive and negative surface functionalities. A commercially available urethane-related photopolymer cured by ultraviolet light was used to make stamps for contact printing with a range of submicrometer down to 80 nm features because of its outstanding mechanical stability and inherent softening transition above 48 degrees C.

引用

页码：1347 / 1350

页数：4

共 21 条

[1] A photocurable poly(dimethylsiloxane) chemistry designed for soft lithographic molding and printing in the nanometer regime
Choi, KM
Rogers, JA
[J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2003, 125 (14) : 4060 - 4061
[2] An ultraviolet-curable mold for sub-100-nm lithography
Choi, SJ
Yoo, PJ
Baek, SJ
Kim, TW
Lee, HH
[J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2004, 126 (25) : 7744 - 7745
[3] Microcontact printing of macromolecules with submicrometer resolution by means of polyolefin stamps
Csucs, G
Künzler, T
Feldman, K
Robin, F
Spencer, ND
[J]. LANGMUIR, 2003, 19 (15) : 6104 - 6109
[4] Stability of molded polydimethylsiloxane microstructures
Delamarche, E
Schmid, H
Michel, B
Biebuyck, H
[J]. ADVANCED MATERIALS, 1997, 9 (09) : 741 - 746
[5] Replication of vertical features smaller than 2 nm by soft lithography
Gates, BD
Whitesides, GM
[J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2003, 125 (49) : 14986 - 14987
[6] Ge HX, 2005, NANO LETT, V5, P179, DOI 10.1012/nl048618k
[7] Constraints on microcontact printing imposed by stamp deformation
Hui, CY
Jagota, A
Lin, YY
Kramer, EJ
[J]. LANGMUIR, 2002, 18 (04) : 1394 - 1407
[8] Polymer-on-polymer stamping: Universal approaches to chemically patterned surfaces
Jiang, XP
Zheng, HP
Gourdin, S
Hammond, PT
[J]. LANGMUIR, 2002, 18 (07) : 2607 - 2615
[9] Ferroelectric lithography of multicomponent nanostructures
Kalinin, SV
Bonnell, DA
Alvarez, T
Lei, XJ
Hu, ZH
Shao, R
Ferris, JH
[J]. ADVANCED MATERIALS, 2004, 16 (9-10) : 795 - +
[10] Physical and chemical nanostructure transfer in polymer spin-transfer printing
Kim, YS
Baek, SJ
Hammond, PT
[J]. ADVANCED MATERIALS, 2004, 16 (07) : 581 - +

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