Attempt to deposit carbon nitride films by electrodeposition from an organic liquid

被引:71
作者
Fu, Q [1 ]
Jiu, JT [1 ]
Cai, K [1 ]
Wang, H [1 ]
Cao, CB [1 ]
Zhu, HS [1 ]
机构
[1] Beijing Inst Technol, Res Ctr Mat Sci, Beijing 100081, Peoples R China
来源
PHYSICAL REVIEW B | 1999年 / 59卷 / 03期
关键词
D O I
10.1103/PhysRevB.59.1693
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Carbon nitride films were synthesized by electrodeposition from an organic liquid on silicon substrates at temperatures lower than 80 degrees C. The N/C ratio in the films is about 0.25. The x-ray diffraction measurement indicates that the film contains some C3N4 polycrystalline phases. The Fourier-transform infrared spectroscopy, x-ray photoelectron spectroscopy, and Raman spectroscopy analyses suggest the presence of both single and double carbon-nitrogen bonds. The deposition mechanisms are also discussed. Our paper shows that the electrodeposition technique may hold some promise for synthesizing the metastable compound C3N4 in the liquid phase. [S0163-1829(99)05403-X].
引用
收藏
页码:1693 / 1696
页数:4
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