Study of the growth mechanisms and properties of (Cr,O,N) films deposited by vacuum arc evaporation

被引：2

作者：

Gautier, C ^{[1
]}

Machet, J ^{[1
]}

机构：

[1] Univ Limoges, Grp PVD, LMCTS, Fac Sci, F-87060 Limoges, France

来源：

TRENDS AND NEW APPLICATIONS OF THIN FILMS | 1998年 / 287-2卷

关键词：

vacuum arc evaporation; deposition process; (Cr; O; N) ternary compounds;

D O I：

10.4028/www.scientific.net/MSF.287-288.393

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Ternary chromium based films (Cr,O,N) have been deposited using the vacuum arc evaporation technique in a reactive (O-2 + N-2) atmosphere. The influence of the oxygen flow rate (Q(O2)) on the structural and mechanical properties of the coatings, has been investigated when the nitrogen flow rate is held constant. It has been found that compounds composed on chromium, oxygen and nitrogen with a high hardness, can be deposited in a narrow range of Q(O2).

引用

页码：393 / 396

页数：4

共 6 条

[1] Comparative study of the stress in chromium films deposited by vacuum arc evaporation, vacuum evaporation, and DC magnetron sputtering [J].

Elstner, F ;

Gautier, C ;

Piot, O ;

Contoux, G ;

Cosset, F ;

Nardou, F ;

Machet, J .

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1996, 154 (02) :669-679

[2]

KOCHENDORFER A, 1994, Z KRISTALLOGR, V105, P438

[3]

KOCHENDORFER A, 1994, Z KRISTALLOGR, V105, P393

[4]

PELLMAN MA, 1993, SURFACE MODIFICATION, V6, P721

[5] THE STRUCTURE AND COLOR OF SOME NITRIDE COATINGS [J].

PERRY, AJ .

THIN SOLID FILMS, 1986, 135 (01) :73-85

[6] DEVELOPMENT OF ARC EVAPORATION OF NONSTOICHIOMETRIC TITANIUM NITRIDE COATINGS [J].

SUE, JA .

SURFACE & COATINGS TECHNOLOGY, 1993, 61 (1-3) :115-120

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