DEVELOPMENT OF ARC EVAPORATION OF NONSTOICHIOMETRIC TITANIUM NITRIDE COATINGS

A family of non-stoichiometric TiN(x) (x < 1) coatings was deposited by the physical vapor deposition, arc evaporation process. The crystallographic orientation, crystallite size, microstrain, residual stress, microhardness and erosion resistance of the coatings were evaluated as a function of their N content. The erosion resistance of the coatings, which is strongly dependent on the crystallite size, residual stress and microhardness, was determined. The optimization of the N content in the coating for erosion performance is discussed.