A COMPARISON OF TIN FILMS PRODUCED BY REACTIVE DC SPUTTERING AND ION-ASSISTED DEPOSITION

被引:18
作者
BIELI, AV [1 ]
KHEYRANDISH, H [1 ]
COLLIGON, JS [1 ]
机构
[1] ACAD SCI BESSR,INST PHYS TECH,MINSK 220730,BELORUSSIA,USSR
关键词
D O I
10.1016/0040-6090(91)90200-H
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The properties of TiN films produced by reactive d.c. sputtering have been compared with those formed by deposition during irradiation by 10 keV nitrogen ions. Films were deposited on aluminium, nickel, molybdenum, silicon and titanium substrates which were chosen because they have a range of mechanical properties. The composition of the films has been studied by Rutherford backscattering, nuclear reaction analysis and transmission electron microscopy and data concerning their hardness and adhesion are also presented. It was found that the films produced by ion-assisted deposition (IAD) were nearly stoichiometric TiN with a predominant (100) orientation while the reactively sputtered films were less crystalline and contained a significant amount of oxygen and carbon throughout the film. There was also considerable improvement in the adhesion of the IAD films but their hardness was only marginally improved.
引用
收藏
页码:283 / 291
页数:9
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