EFFECT OF ION-BOMBARDMENT ON THE STRUCTURE OF SPUTTERED TI-N FILMS

被引：9

作者：

MUSIL, J ^{[1
]}

POULEK, V ^{[1
]}

KADLEC, S ^{[1
]}

VYSKOCIL, J ^{[1
]}

VALVODA, V ^{[1
]}

CERNY, R ^{[1
]}

KUZEL, R ^{[1
]}

机构：

[1] CHARLES UNIV, FAC MATH & PHYS, DEPT SEMICOND PHYS, CS-12116 PRAGUE 2, CZECHOSLOVAKIA

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1989年 / 37-8卷

关键词：

D O I：

10.1016/0168-583X(89)90323-6

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：897 / 901

页数：5

共 8 条

[1]

KADLEC S, 1987, PHOTON BEAM PLASMA A, V15, P161

[2] MORPHOLOGY AND PROPERTIES OF SPUTTERED TIN LAYERS AS A FUNCTION OF SUBSTRATE-TEMPERATURE AND SPUTTERING PRESSURE [J].

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JEHN, HA .

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[3] A HIGH-RATE SPUTTERING PROCESS FOR THE FORMATION OF HARD FRICTION-REDUCING TIN COATINGS ON TOOLS [J].

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[4] TINX COATINGS PREPARED BY DC REACTIVE MAGNETRON SPUTTERING [J].

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[5] INFLUENCE OF SUBSTRATE BIAS ON THE COMPOSITION, STRUCTURE AND ELECTRICAL-PROPERTIES OF REACTIVELY DC-SPUTTERED TIN FILMS [J].

POITEVIN, JM ;

LEMPERIERE, G ;

TARDY, J .

THIN SOLID FILMS, 1982, 97 (01) :69-77

[6] TIN HARD COATINGS DEPOSITED ON HIGH-SPEED STEEL SUBSTRATES BY REACTIVE DIRECT-CURRENT MAGNETRON SPUTTERING [J].

SCHILLER, S ;

BEISTER, G ;

RESCHKE, J ;

HOETZSCH, G .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04) :2180-2183

[7] REACTIVELY SPUTTERED NITRIDES AND CARBIDES OF TITANIUM, ZIRCONIUM, AND HAFNIUM [J].

SPROUL, WD .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :2874-2878

[8] STRUCTURE AND PROPERTIES OF TIN COATINGS [J].

SUNDGREN, JE .

THIN SOLID FILMS, 1985, 128 (1-2) :21-44

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