STRUCTURE AND PROPERTIES OF TIN COATINGS

被引：844

作者：

SUNDGREN, JE

机构：

来源：

THIN SOLID FILMS | 1985年 / 128卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(85)90333-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：21 / 44

页数：24

共 72 条

[1] INVESTIGATION OF TIN FILMS REACTIVELY SPUTTERED USING A SPUTTER GUN [J].

AHN, KY ;

WITTMER, M ;

TING, CY .

THIN SOLID FILMS, 1983, 107 (01) :45-54

[2] EFFECT OF IMPURITIES ON INTRINSIC STRESS IN THIN NI FILMS [J].

ALEXANDER, PM ;

HOFFMAN, RW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01) :96-98

[3] CHARACTERIZATION OF TITANIUM NITRIDE FILMS DEPOSITED ONTO SILICON [J].

ARMIGLIATO, A ;

CELOTTI, G ;

GARULLI, A ;

GUERRI, S ;

OSTOJA, P ;

ROSA, R ;

MARTINELLI, G .

THIN SOLID FILMS, 1982, 92 (04) :341-346

[4]

BLACHMAN AG, 1973, J VAC SCI TECHNOL, V10, P355

[5] ARRANGEMENT OF OPTICAL MEASUREMENT VALUES FOR ELECTRONIC BAND-STRUCTURE IN MIXED-CRYSTAL SERIES TI(C,N) [J].

BOHM, G ;

GORETZKI, H .

JOURNAL OF THE LESS-COMMON METALS, 1972, 27 (03) :311-&

[6] TIN COATINGS ON STEEL [J].

BUHL, R ;

PULKER, HK ;

MOLL, E .

THIN SOLID FILMS, 1981, 80 (1-3) :265-270

[7]

CHASSAING G, 1980, VIDE COUCHE MINCES S, V201, P389

[8] MICROHARDNESS OF TINX COATINGS OBTAINED BY REACTIVE CATHODIC SPUTTERING [J].

CHEVALLIER, J ;

CHABERT, JP .

THIN SOLID FILMS, 1981, 80 (1-3) :263-263

[9]

COUTTS TJ, 1978, ACTIVE PASSIVE THIN, pCH3

[10] EFFECT OF NONSTOICHIOMETRY ON OPTICAL-PROPERTIES OF THIN-FILMS OF TINX [J].

DEMAAYER, PJP ;

MACKENZIE, JD .

PHILOSOPHICAL MAGAZINE, 1976, 34 (06) :1191-1195

← 1 2 3 4 5 6 7 8 →