INFLUENCE OF SUBSTRATE BIAS ON THE COMPOSITION, STRUCTURE AND ELECTRICAL-PROPERTIES OF REACTIVELY DC-SPUTTERED TIN FILMS

被引：96

作者：

POITEVIN, JM ^{[1
]}

LEMPERIERE, G ^{[1
]}

TARDY, J ^{[1
]}

机构：

[1] UNIV LYON 1,PHYS MAT LAB,CNRS LAB,F-69621 VILLEURBANNE,FRANCE

来源：

关键词：

D O I：

10.1016/0040-6090(82)90418-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：69 / 77

页数：9

共 17 条

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[8] Guinier A., 1964, THEORIE TECHNIQUE RA, P482
[9] THE EFFECTS OF SUBSTRATE BIAS ON THE STRUCTURAL AND ELECTRICAL-PROPERTIES OF TIN FILMS PREPARED BY REACTIVE RF SPUTTERING
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MITSUHASHI, H
[J]. THIN SOLID FILMS, 1980, 70 (01) : 17 - 25
[10] MAENPAA M, 1980, P S THIN FILM INTERF, V80, P316