Polymers in conventional and alternative lithography for the fabrication of nanostructures

被引：176

作者：

Acikgoz, Canet ^{[1
]}

Hempenius, Mark A.

Huskens, Jurriaan ^{[1
]}

Vancso, G. Julius

机构：

[1] Univ Twente, MESA Inst Nanotechnol, Mol Nanofabricat Grp, NL-7500 AE Enschede, Netherlands

来源：

EUROPEAN POLYMER JOURNAL | 2011年 / 47卷 / 11期

关键词：

Polymer resists; Conventional lithography; Alternative lithography; Patterning; Colloidal assembly; Nanoimprint lithography; FLASH IMPRINT LITHOGRAPHY; SELF-ASSEMBLED MONOLAYERS; NANOIMPRINT LITHOGRAPHY; ROOM-TEMPERATURE; NANOMETER-SCALE; ELECTROPHORETIC DEPOSITION; HYDROGEN SILSESQUIOXANE; NANOSPHERE LITHOGRAPHY; COLLOIDAL MONOLAYERS; PATTERN TRANSFER;

D O I：

10.1016/j.eurpolymj.2011.07.025

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 [高分子化学与物理];

摘要：

This review provides a survey of lithography techniques and the resist materials employed with these techniques. The first part focuses on the conventional lithography methods used to fabricate complex micro- and nano-structured surfaces. In the second part, emphasis is placed on patterning with unconventional lithography techniques such as printing, molding, and embossing, and on their development into viable, high-resolution patterning technologies. (C) 2011 Elsevier Ltd. All rights reserved.

引用

页码：2033 / 2052

页数：20

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