CF4 plasma treatment of asymmetric polysulfone membranes

被引：55

作者：

Hopkins, J ^{[1
]}

Badyal, JPS ^{[1
]}

机构：

[1] UNIV DURHAM,DEPT CHEM,SCI LABS,DURHAM DH1 3LE,ENGLAND

来源：

LANGMUIR | 1996年 / 12卷 / 15期

关键词：

D O I：

10.1021/la960038i

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

CF4 glow discharge treatment; of asymmetric polysulfone membranes has been investigated by X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and gas permeability measurements. Oxygen and nitrogen gas permeability and permselectivity through the polysulfone substrate are found to be strongly influenced by the plasma-processing parameters.

引用

收藏

页码：3666 / 3670

页数：5

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