Applied electrostatic parallelogram actuators for microwave switches using the standard CMOS process

被引:9
作者
Dai, CL [1 ]
Yen, KS
Chang, PZ
机构
[1] Oriental Inst Technol, Dept Mech Engn, Taipei 220, Taiwan
[2] Natl Taiwan Univ, Inst Appl Mech, Taipei 107, Taiwan
关键词
CMOS integrated circuits - Dry etching - Electric connectors - Electric potential - Electric traction - Insertion losses - Micromachining - Microwave devices - Polysilicon - Substrates;
D O I
10.1088/0960-1317/11/6/311
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents the fabrication of a laminated-suspension microwave switch using a conventional 0.6 mum single polysilicon three metals complementary metal-oxide semiconductor process. The post-processing is completed with maskless dry etching. The micromachined microwave switch consists of two electrostatic parallelogram actuators, two T-type connectors and one coplanar waveguide on a p-type silicon. substrate. The switch only requires a low dc voltage of around 18 V for electrostatic traction. The testing results of the microwave switch show that the insertion loss is 6.8 dB and isolation is -7.8 dB in the range 10-20 GHz. In addition to demonstrating the design and fabrication of the microwave switch. this paper summarizes the experimental results.
引用
收藏
页码:697 / 702
页数:6
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