Irreversible Change in the NO Adsorption State on Pt(111) under High Pressure Studied by AP-XPS, NEXAFS, and STM

被引:24
作者
Shimada, Toru [2 ]
Mun, Bongjin Simon [3 ]
Nakai, Ikuyo F. [4 ]
Banno, Atsushi [5 ]
Abe, Hitoshi [1 ]
Iwasawa, Yasuhiro [6 ]
Ohta, Toshiaki [7 ]
Kondoh, Hiroshi [1 ]
机构
[1] Keio Univ, Dept Chem, Yokohama, Kanagawa 2238522, Japan
[2] Free Univ Berlin, Fachbereich Phys, D-14195 Berlin, Germany
[3] Hanyang Univ, Dept Appl Phys, ERICA, Seoul 426791, South Korea
[4] Kyoto Univ, Grad Sch Sci, Dept Chem, Kyoto 6068502, Japan
[5] Univ Tokyo, Grad Sch Sci, Dept Chem, Tokyo 1130033, Japan
[6] Univ Electrocommun, Dept Appl Phys & Chem, Tokyo 1828585, Japan
[7] Ritsumeikan Univ, SR Ctr, Shiga 5258577, Japan
关键词
FINE-STRUCTURE SPECTROSCOPY; SCANNING-TUNNELING-MICROSCOPY; HIGH-RESOLUTION XPS; RH(111) SURFACES; NITRIC-OXIDE; COVERAGE; AG(111); NO/PT(111); PRECURSOR; RU(001);
D O I
10.1021/jp102777j
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Ambient pressure X-ray photoelectron spectroscopy (AP-XPS) has been applied to the investigation of NO adsorption on Pt(111) under various pressures of NO (up to 1 Torr) at room temperature. Under 10(-7) Torr, molecular NO occupies the most stable fcc-hollow sites and partially occupies the energetically unfavorable atop sites. NO reversibly desorbs from the atop sites after evacuation. At NO pressures higher than 10(-6) Torr. however, irreversible adsorption or atomic oxygen takes place via NO dissociation, leading to the formation of NO+C) domains. This result is consistent with near-edge X-ray absorption fine structure (NIHXAFS) and scanning tunneling microscopy (STM) results.
引用
收藏
页码:17030 / 17035
页数:6
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