Contribution of x-ray topography and high-resolution diffraction to the study of defects in SiC

被引:59
作者
Dudley, M [1 ]
Huang, XR [1 ]
Vetter, WM [1 ]
机构
[1] SUNY Stony Brook, Dept Mat Sci & Engn, Stony Brook, NY 11794 USA
关键词
D O I
10.1088/0022-3727/36/10A/307
中图分类号
O59 [应用物理学];
学科分类号
摘要
A short review is presented of the various synchrotron white beam x-ray topography (SWBXT) imaging techniques developed for characterization of silicon carbide (SIC) crystals and thin films. These techniques, including back-reflection topography, reticulography, transmission topography, and a set of section topography techniques, are demonstrated to be particularly powerful for imaging hollow-core screw dislocations (micropipes) and closed-core threading screw dislocations, as well as other defects, in SiC. The geometrical diffraction mechanism commonly underlying these imaging processes is emphasized for understanding the nature and origins of these defects. Also introduced is the application of SWBXT combined with high-resolution x-ray diffraction techniques to complete characterization of 3C/4H or 3C/6H SiC heterostructures, including polytype identification, 3C variant mapping, and accurate lattice mismatch measurements.
引用
收藏
页码:A30 / A36
页数:7
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