Proton irradiation of ZnO Schottky diodes

被引:17
作者
Khanna, R [1 ]
Ip, K
Allums, KK
Baik, K
Abernathy, CR
Pearton, SJ
Heo, YW
Norton, DP
Ren, F
Shojah-Ardalan, S
Wilkins, R
机构
[1] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
[2] Univ Florida, Dept Chem Engn, Gainesville, FL 32611 USA
[3] Prairie View A&M Univ, Ctr Appl Radiat Res, Prairie View, TX 77446 USA
关键词
ZnO; Schottky diodes; proton irradiation; radiation hard;
D O I
10.1007/s11664-005-0117-2
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Zinc oxide is generally considered to be radiation hard, although there are few experimental reports supporting this assertion. In this paper, we present results on the changes in electrical performance of bulk Pt/ZnO Schottky rectifiers exposed to 40-MeV protons at fluences from 5 X 10(9) cm(-2) to 5 X 10(10) cm(-2). These doses correspond to more than 10 years or 100 years, respectively, in low-earth satellite orbit. The reverse breakdown voltage of the ZnO diodes increased from similar to 3.6 V in unirradiated devices to similar to 4 V after the highest proton dose. The effective barrier height decreased with proton dose, while the diode ideality factor increased from 1.8 to 1.9 for the highest dose. These devices appear promising for both aerospace and terrestrial applications where irradiation hardness is a prerequisite. The main degradation mechanism appears to be creation of recombination centers and traps.
引用
收藏
页码:395 / 398
页数:4
相关论文
共 18 条
[1]   Electrical characterization of vapor-phase-grown single-crystal ZnO [J].
Auret, FD ;
Goodman, SA ;
Legodi, MJ ;
Meyer, WE ;
Look, DC .
APPLIED PHYSICS LETTERS, 2002, 80 (08) :1340-1342
[2]   Radiation hardness of ZnO at low temperatures [J].
Coskun, C ;
Look, DC ;
Farlow, GC ;
Sizelove, JR .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2004, 19 (06) :752-754
[3]  
DYER CS, 1997, QINETIQKISPACETR0106
[4]  
HARTNAGEL H., 1995, Semiconducting Transparent Thin Films
[5]   Transport properties of phosphorus-doped ZnO thin films [J].
Heo, YW ;
Park, SJ ;
Ip, K ;
Pearton, SJ ;
Norton, DP .
APPLIED PHYSICS LETTERS, 2003, 83 (06) :1128-1130
[6]   Annealing temperature dependence of contact resistance and stablity for Ti/Al/Pt/Au ohmic contacts to bulk n-ZnO [J].
Ip, K ;
Baik, KH ;
Heo, YW ;
Norton, DP ;
Pearton, SJ ;
LaRoche, JR ;
Luo, B ;
Ren, F ;
Zavada, JM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (06) :2378-2381
[7]   p-type electrical conduction in ZnO thin films by Ga and N codoping [J].
Joseph, M ;
Tabata, H ;
Kawai, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1999, 38 (11A) :L1205-L1207
[8]   Observation of resonant tunneling action in ZnO/Zn0.8Mg0.2O devices [J].
Krishnamoorthy, S ;
Iliadis, AA ;
Inumpudi, A ;
Choopun, S ;
Vispute, RD ;
Venkatesan, T .
SOLID-STATE ELECTRONICS, 2002, 46 (10) :1633-1637
[9]   Implant isolation of ZnO [J].
Kucheyev, SO ;
Jagadish, C ;
Williams, JS ;
Deenapanray, PNK ;
Yano, M ;
Koike, K ;
Sasa, S ;
Inoue, M ;
Ogata, K .
JOURNAL OF APPLIED PHYSICS, 2003, 93 (05) :2972-2976
[10]   Mechanical deformation of single-crystal ZnO [J].
Kucheyev, SO ;
Bradby, JE ;
Williams, JS ;
Jagadish, C ;
Swain, MV .
APPLIED PHYSICS LETTERS, 2002, 80 (06) :956-958