Quantum oscillations in the layer structure of thin metal films

被引：63

作者：

Czoschke, P

Hong, HW

Basile, L

Chiang, TC

机构：

[1] Univ Illinois, Dept Phys, Urbana, IL 61801 USA

[2] Univ Illinois, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA

来源：

PHYSICAL REVIEW LETTERS | 2003年 / 91卷 / 22期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1103/PhysRevLett.91.226801

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Understanding the underlying physical principles that determine the internal structure of objects at the atomic scale is critical for the advancement of nanoscale science. We have performed synchrotron x-ray diffraction studies to determine the structural properties of smooth Pb films with varying thicknesses of 6 to 18 monolayers deposited on a Si(111) substrate at 110 K. We observe quasibilayer variations in the atomic interlayer spacings of the films consistent with charge density oscillations due to quantum confinement of conduction electrons and surface-interface interference effects. Quantum oscillations in atomic step height are also deduced.

引用

收藏

页码：1 / 226801

页数：4

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