Hydrogen collision model: Quantitative description of metastability in amorphous silicon

被引:204
作者
Branz, HM [1 ]
机构
[1] Natl Renewable Energy Lab, Golden, CO 80401 USA
来源
PHYSICAL REVIEW B | 1999年 / 59卷 / 08期
关键词
D O I
10.1103/PhysRevB.59.5498
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The hydrogen collision model of light-induced metastability in hydrogenated amorphous silicon is described in detail. Recombination of photogenerated carriers excites mobile H from Si-H bonds, leaving threefold-coordinated Si dangling-bond defects. When two mobile H atoms collide and associate in a metastable two-H complex, the-two dangling bonds from which H was emitted also become metastable. The proposed microscopic mechanism is consistent with electron-spin-resonance experiments. Comprehensive rate equations for the dangling-bond and mobile-H densities are presented; these equations include light-induced creation and annealing, Important regimes are solved analytically and numerically. The model provides explanations for both the t(1/3) time dependence: of the rise of defect density during continuous illumination and the t(1/2) time-dependence during intense laser-pulse illumination. Other consequences and predictions of the H collision model are described. [S0165-1829(99)04308-8].
引用
收藏
页码:5498 / 5512
页数:15
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