Study of the kinetics of step and flash imprint lithography photopolymerization

被引：34

作者：

Dickey, MD ^{[1
]}

Burns, RL ^{[1
]}

Kim, EK ^{[1
]}

Johnson, SC ^{[1
]}

Stacey, NA ^{[1
]}

Willson, CG ^{[1
]}

机构：

[1] Univ Texas, Austin, TX 78712 USA

来源：

AICHE JOURNAL | 2005年 / 51卷 / 09期

关键词：

nanoimprint lithography; reaction kinetics; photopolymerization;

D O I：

10.1002/aic.10477

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

Step and Flash Imprint Lithography (SFIL) is a promising high-resolution, yet low-cost patterning technique that uses a UV induced photopolymerization to replicate features on a patterned template. The SFIL process utilizes an acrylate-based free radical polymerization, which is inhibited by oxygen. A semiempirical kinetic model is presented that demonstrates the effects of oxygen on SFIL. On the basis of kinetic measurements, dissolved oxygen causes an inhibition period at the onset of exposure that extends the required exposure time. Oxygen inhibition also results in a thin perimeter of under-cured material surrounding the template due to oxygen diffusion from the ambient during polymerization. The model allows us to study the impact of oxygen on SFIL as a function of various formulation and exposure variables. Methods of limiting the impact of oxygen are presented, such as alternative chemistries and inerting techniques. (c) 2005 American Institute of Chemical Engineers.

引用

页码：2547 / 2555

页数：9

共 42 条

[31] KINETICS OF ANISOTROPIC PHOTOPOLYMERIZATION IN POLYMER MATRIX [J].