The fabrication process of highly porous SnO2 thick film by reaction between tin ions and oxygen gas generated by an anodic applied potential on substrates in SnCl2 aqueous solution is reported; moreover, we succeeded in forming porous SnO2 micropatterns through site-selective deposition on a Pt-patterned F-doped SnO2 (FTO) coated substrate.
机构:
Osaka Municipal Tech Res Inst, Dept Inorgan Chem, Joto Ku, Osaka 5368553, JapanOsaka Municipal Tech Res Inst, Dept Inorgan Chem, Joto Ku, Osaka 5368553, Japan
Chigane, M
Ishikawa, M
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机构:
Osaka Municipal Tech Res Inst, Dept Inorgan Chem, Joto Ku, Osaka 5368553, JapanOsaka Municipal Tech Res Inst, Dept Inorgan Chem, Joto Ku, Osaka 5368553, Japan
机构:
Osaka Municipal Tech Res Inst, Dept Inorgan Chem, Joto Ku, Osaka 5368553, JapanOsaka Municipal Tech Res Inst, Dept Inorgan Chem, Joto Ku, Osaka 5368553, Japan
Chigane, M
Ishikawa, M
论文数: 0引用数: 0
h-index: 0
机构:
Osaka Municipal Tech Res Inst, Dept Inorgan Chem, Joto Ku, Osaka 5368553, JapanOsaka Municipal Tech Res Inst, Dept Inorgan Chem, Joto Ku, Osaka 5368553, Japan