Fabrication of homostructural ZnO p-n junctions and ohmic contacts to arsenic-doped p-type ZnO

被引:135
作者
Ryu, YR
Lee, TS
Leem, JH
White, HW
机构
[1] MOXtron Inc, Columbia, MO 65203 USA
[2] MOXTRONICS, Kwangju 500460, South Korea
[3] Univ Missouri, Dept Phys & Astron, Columbia, MO 65211 USA
关键词
D O I
10.1063/1.1625787
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report fabrication of homostructural ZnO p-n junctions that contain arsenic (As)-doped ZnO (ZnO:As) and intrinsic n-type ZnO layers. We also describe the metallization process for forming ohmic contacts to p-type ZnO. ZnO films were synthesized on n-type SiC substrates by hybrid beam deposition. Ni/Au metal contacts show linear I-V characteristics indicative of ohmic behavior, while other metal contacts (e.g., In/Au and Ti/Au) show nonlinear characteristics with rectification that reveal the presence of Schottky barriers. The characteristics for p-n junctions composed of ZnO layers are confirmed by I-V measurements. (C) 2003 American Institute of Physics.
引用
收藏
页码:4032 / 4034
页数:3
相关论文
共 7 条
[1]   Characterization of homoepitaxial p-type ZnO grown by molecular beam epitaxy [J].
Look, DC ;
Reynolds, DC ;
Litton, CW ;
Jones, RL ;
Eason, DB ;
Cantwell, G .
APPLIED PHYSICS LETTERS, 2002, 81 (10) :1830-1832
[2]   Fabrication of homostructural ZnO p-n junctions [J].
Ryu, YR ;
Kim, WJ ;
White, HW .
JOURNAL OF CRYSTAL GROWTH, 2000, 219 (04) :419-422
[3]   Properties of arsenic-doped p-type ZnO grown by hybrid beam deposition [J].
Ryu, YR ;
Lee, TS ;
White, HW .
APPLIED PHYSICS LETTERS, 2003, 83 (01) :87-89
[4]   Synthesis of p-type ZnO films [J].
Ryu, YR ;
Zhu, S ;
Look, DC ;
Wrobel, JM ;
Jeong, HM ;
White, HW .
JOURNAL OF CRYSTAL GROWTH, 2000, 216 (1-4) :330-334
[5]  
RYU YR, IN PRESS J CRYST GRO
[6]  
SCHETZINA JF, 1997, Patent No. 5679965
[7]   METAL SCHOTTKY-BARRIER CONTACTS TO ALPHA-6H-SIC [J].
WALDROP, JR ;
GRANT, RW ;
WANG, YC ;
DAVIS, RF .
JOURNAL OF APPLIED PHYSICS, 1992, 72 (10) :4757-4760