pH-sensitive thin hydrogel microfabricated by photolithography

被引：43

作者：

Chen, GP

Imanishi, Y

Ito, Y ^{[1
]}

机构：

[1] NAIST, Grad Sch Mat Sci, Ikoma 6300101, Japan

[2] Japan Sci & Technol Cirp, PRESTO, Seika, Kyoto 6190237, Japan

来源：

LANGMUIR | 1998年 / 14卷 / 22期

关键词：

D O I：

10.1021/la9806303

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

[No abstract available]

引用

页码：6610 / 6612

页数：3

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