Use of phosphine as an n-type dopant source for vapor-liquid-solid growth of silicon nanowires

被引:127
作者
Wang, YF [1 ]
Lew, KK [1 ]
Ho, TT [1 ]
Pan, L [1 ]
Novak, SW [1 ]
Dickey, EC [1 ]
Redwing, JM [1 ]
Mayer, TS [1 ]
机构
[1] Penn State Univ, Dept Elect Engn, Dept Mat Sci & Engn, University Pk, PA 16802 USA
关键词
D O I
10.1021/nl051442h
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Phosphine (PH3) was investigated as an n-type dopant source for Au-catalyzed vapor-liquid-solid (VLS) growth of phosphorus-doped silicon nanowires (SiNWs). Transmission electron microscopy characterization revealed that the as-grown SiNWs were predominately single crystal even at high phosphorus concentrations. Four-point resistance and gate-dependent conductance measurements confirmed that electrically active phosphorus was incorporated into the SiNWs during VLS growth. A transition was observed from p-type conduction for nominally undoped SiNWs to n-type conduction upon the introduction of PH3 to the inlet gas. The resistivity of the n-type SiNWs decreased by approximately 3 orders of magnitude as the inlet PH3 to silane (SiH4) gas ratio was increased from 2 x 10(-5) to 2 x 10(-3). These results demonstrate that PH3 can be used to produce n-type SiNWs with properties that are suitable for electronic and optoelectronic device applications.
引用
收藏
页码:2139 / 2143
页数:5
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