Ionization of sputtered metal atoms in a microwave ECR plasma source

被引：8

作者：

Poluektov, NP ^{[1
]}

Kharchenko, VN ^{[1
]}

Usatov, IG ^{[1
]}

机构：

[1] Moscow State Univ Forestry, Mytishchi 141005, Moscow Oblast, Russia

来源：

PLASMA PHYSICS REPORTS | 2001年 / 27卷 / 07期

关键词：

D O I：

10.1134/1.1385443

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

The ionization of sputtered aluminum atoms in the plasma of a microwave ECR discharge intended for metal coating of submicron-size structures in microelectronics is studied. The spatial distributions of xenon plasma parameters and their variations under the action of metal atoms are investigated using probe and optical emission spectroscopy techniques. (C) 2001 MAIK "Nauka/Interperiodica".

引用

页码：625 / 633

页数：9

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