Preparation and characterization of titanium oxy-nitride thin films

被引:75
作者
Braic, M.
Balaceanu, M.
Vladescu, A.
Kiss, A.
Braic, V.
Epurescu, G.
Dinescu, G.
Moldovan, A.
Birjega, R.
Dinescu, M.
机构
[1] Natl Inst Laser Plasma & Radiat Phys, RO-77125 Bucharest, Romania
[2] Natl Inst Optoelect, Tehnoprof Ctr, RO-77125 Bucharest, Romania
关键词
Ti oxy-nitride; physical; microchemical and mechanical properties;
D O I
10.1016/j.apsusc.2007.02.179
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The interest in TiNxOy films has increased recently due to their properties dependence on the N/O ratio. In this work, we studied comparatively the influence of different flow rate ratios of the reactive gases (O-2 and N-2) on the properties of the TiNxOY films deposited by two different methods: rf pulsed laser deposition (rf PLD) and reactive pulsed magnetron sputtering (R-PM). Film structure and composition were studied by XRD and XPS methods, while film surface morphology was analyzed with AFM. Mechanical characteristics as Vickers microhardness and adhesion (scratch tests) were also determined. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:8210 / 8214
页数:5
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