Coplanar and grazing incidence x-ray-diffraction investigation of self-organized SiGe quantum dot multilayers

被引:42
作者
Holy, V
Darhuber, AA
Stangl, J
Zerlauth, S
Schaffler, F
Bauer, G
Darowski, N
Lubbert, D
Pietsch, U
Vavra, I
机构
[1] Johannes Kepler Univ Linz, Inst Semicond Phys, A-4040 Linz, Austria
[2] Univ Potsdam, Inst Phys, Potsdam, Germany
[3] Slovak Acad Sci, Inst Elect Engn, SK-84239 Bratislava, Slovakia
[4] Masaryk Univ, Lab Thin Films & Nanostruct, CS-61137 Brno, Czech Republic
[5] Fraunhofer Inst Zerstorungsfreie Prufverfahren, D-01326 Dresden, Germany
来源
PHYSICAL REVIEW B | 1998年 / 58卷 / 12期
关键词
D O I
10.1103/PhysRevB.58.7934
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report on a formalism for the calculation of diffusely scattered x-ray intensity from spatially inhomogeneous strain fields in Ge rich islands and in the surrounding Si matrix of SiGe/Si multilayers. The data analysis is based on a theory considering the two-dimensional statistical distribution of the dot positions, which allows a common formalism for both coplanar and grazing incidence scattering geometries. The strain fields were simulated based on the approach of the elastic Green function, taking the influence of the elastic strain relaxation at the sample surface into account. From these simulations the degree of relaxation of the islands was obtained, which compared very well with experimental data derived from x-ray reciprocal space maps. [S0163-1829(98)02736-2].
引用
收藏
页码:7934 / 7943
页数:10
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