Correlation between structure and optoelectronic properties of undoped microcrystalline silicon

被引:31
作者
Siebke, F
Yata, S
Hishikawa, Y
Tanaka, M
机构
[1] Forschungszentrum Julich, Inst Thin Film & Ion Technol, D-52425 Julich, Germany
[2] Sanyo Elect Co Ltd, New Mat Res Ctr, Hirakata, Osaka 573, Japan
关键词
silicon; nanocrystalline materials; optical properties; electric properties; structure;
D O I
10.1016/S0022-3093(98)00261-0
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The correlation between crystallinity and optoelectronic properties of undoped microcrystalline silicon is investigated. The use of the constant photocurrent method for measurement of microcrystalline silicon is discussed. This method measures the true absorption coefficient only if the crystallinity is a major fraction of a sample. If the crystalline volume fraction is less, it underestimates the absorption coefficient at smaller photon energies. At these energies, carriers are mainly photogenerated in the crystalline phase. Carriers generated in isolated grains contribute less to the photocurrent than carriers generated in grains which are embedded in percolation paths. The shape of constant photocurrent method spectra of microcrystalline silicon with a poor crystallinity differs from spectra of material with better crystallinity. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:977 / 981
页数:5
相关论文
共 15 条
[1]   Ambipolar diffusion length and photoconductivity measurements on ''midgap'' hydrogenated microcrystalline silicon [J].
Goerlitzer, M ;
Beck, N ;
Torres, P ;
Meier, J ;
Wyrsch, N ;
Shah, A .
JOURNAL OF APPLIED PHYSICS, 1996, 80 (09) :5111-5115
[2]  
HAMMA S, 1997, IN PRESS J APPL PHYS
[3]   INTERFERENCE-FREE DETERMINATION OF THE OPTICAL-ABSORPTION COEFFICIENT AND THE OPTICAL GAP OF AMORPHOUS-SILICON THIN-FILMS [J].
HISHIKAWA, Y ;
NAKAMURA, N ;
TSUDA, S ;
NAKANO, S ;
KISHI, Y ;
KUWANO, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (05) :1008-1014
[4]   PHOTOTHERMAL DEFLECTION SPECTROSCOPY AND DETECTION [J].
JACKSON, WB ;
AMER, NM ;
BOCCARA, AC ;
FOURNIER, D .
APPLIED OPTICS, 1981, 20 (08) :1333-1344
[5]   Structure and growth of hydrogenated microcrystalline silicon: Investigation by transmission electron microscopy and Raman spectroscopy of films grown at different plasma excitation frequencies [J].
Luysberg, M ;
Hapke, P ;
Carius, R ;
Finger, F .
PHILOSOPHICAL MAGAZINE A-PHYSICS OF CONDENSED MATTER STRUCTURE DEFECTS AND MECHANICAL PROPERTIES, 1997, 75 (01) :31-47
[6]   On the way towards high efficiency thin film silicon solar cells by the ''micromorph'' concept [J].
Meier, J ;
Torres, P ;
Platz, R ;
Dubail, S ;
Kroll, U ;
Selvan, JAA ;
Vaucher, NP ;
Hof, C ;
Fischer, D ;
Keppner, H ;
Shah, A ;
Ufert, KD ;
Giannoules, P ;
Koehler, J .
AMORPHOUS SILICON TECHNOLOGY - 1996, 1996, 420 :3-14
[7]   ON THE MECHANISM OF DOPING AND DEFECT FORMATION IN A-SI-H [J].
PIERZ, K ;
FUHS, W ;
MELL, H .
PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1991, 63 (01) :123-141
[8]   THE ONE PHONON RAMAN-SPECTRUM IN MICROCRYSTALLINE SILICON [J].
RICHTER, H ;
WANG, ZP ;
LEY, L .
SOLID STATE COMMUNICATIONS, 1981, 39 (05) :625-629
[9]   CHARACTERIZATION OF THE DEFECT DENSITY AND BAND TAIL OF AN A-SI-H I-LAYER FOR SOLAR-CELLS BY IMPROVED CPM MEASUREMENTS [J].
SASAKI, M ;
OKAMOTO, S ;
HISHIKAWA, Y ;
TSUDA, S ;
NAKANO, S .
SOLAR ENERGY MATERIALS AND SOLAR CELLS, 1994, 34 (1-4) :541-547
[10]  
SCHER H, 1979, J CHEM PHYS, V53, P952