Anisotropically etched Si mold for solid polymer dye microcavity laser

被引：13

作者：

Sasaki, H ^{[1
]}

Li, YG ^{[1
]}

Akatu, Y ^{[1
]}

Fujii, T ^{[1
]}

Hane, K ^{[1
]}

机构：

[1] Tohoku Univ, Dept Mechatron & Precis Engn, Sendai, Miyagi 9808579, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2000年 / 39卷 / 12B期

关键词：

dye laser; microcavity; Si mold; anisotropic etching; smooth surface;

D O I：

10.1143/JJAP.39.7145

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A new method for solid polymer dye microcavity laser fabrication is described. The hexagonal prism-shaped cavity is fabricated using a mold of Si (111) wafer. Dry etching is used to form the main shape of the cavity, and subsequent anisotropic etching is applied for a short time to smooth the etched surface. The etchant used is ethylenediamine pyrocatechol and water. From this Si mold, an array of hundreds of microcavity replicas are obtained at once. The lasing from the fabricated cavities is confirmed by sharp peaks in the emission spectrum.

引用

页码：7145 / 7149

页数：5

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