Secondary ion emission from polymer surfaces under Ar+, Xe+ and SF5+ ion bombardment

被引:176
作者
Kotter, F [1 ]
Benninghoven, A [1 ]
机构
[1] Univ Munster, Inst Phys, D-48149 Munster, Germany
关键词
surface mass spectrometry; SIMS; polymers; surface analysis;
D O I
10.1016/S0169-4332(97)00515-1
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We investigated the characteristic molecular secondary ion emission from polymer surfaces under 10 keV Ar+, Xe+ and SF5+ bombardment. Secondary ion yields of PET, PP, PTFE, PS, PC, PMMA and PEG were determined under static SIMS conditions. Damage cross sections were measured for PS and PC. We applied a time-of-flight mass spectrometer, equipped with a pulsed EI-source allowing the application of mass separated primary ion beams. Spin coated multilayers as well as surfaces of bulk polymers have been studied. Changing from Ar+ to Xe+ and to SF5+ bombardment we found a strong increase of the yield Y (up to a factor of 1000) and a much smaller increase in the corresponding damage cross sections sigma (up to a factor of 6) for characteristic molecular secondary ions. Both effects are more pronounced in the high mass range. The corresponding increases in secondary ion formation efficiencies ranges between a factor of 5 and 50, depending on the polymer species, the sample preparation and the mass range. Preliminary results for monomolecular overlayers on Ag and Si indicate a similar behaviour of their characteristic secondary ion emission. (C) 1998 Elsevier Science B.V. All rights reserved.
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页码:47 / 57
页数:11
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