Excitation energy dependence of the photoluminescence band at 2.7 and 4.3 eV in silica glass at low temperature

被引:16
作者
Sakurai, Y [1 ]
Nagasawa, K [1 ]
机构
[1] Shonan Inst Technol, Dept Elect Engn, Kanagawa 2518511, Japan
关键词
D O I
10.1016/S0022-3093(01)00803-1
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In this paper, we report the excitation energy dependence of the 2.7 and 4.3 eV photo luminescence (PL) bands in oxygen deficient silica glass at low temperature (similar to 20 K). The increase or decrease of the PL intensity at low temperatures is different for different exciting light wavelengths. The PL intensity tended to decrease with low temperatures when the excitation was near the upper and lower end of the excited level. The peak energy of the excitation spectrum increases with cooling. These results indicate that the change in excitation level with cooling is associated with the low-temperature dependence of light emission. Thermal motion is suppressed, when the sample temperature is lowered, and the energy-width of the excited level decreases, i.e., the light emission probability decreases (the emission intensity decreases), when near the upper and lower end of the excitation level. These phenomena were observed in the low-temperature dependence of the 4.3 eV emission intensity. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:189 / 193
页数:5
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