A novel method to determine the Ehrlich-Schwoebel barrier

被引：19

作者：

Gerlach, R ^{[1
]}

Maroutian, T ^{[1
]}

Douillard, L ^{[1
]}

Martinotti, D ^{[1
]}

Ernst, HJ ^{[1
]}

机构：

[1] CEA Saclay, DSM, DRECAM, SPSCI,Ctr Etud Saclay, F-91191 Gif Sur Yvette, France

来源：

SURFACE SCIENCE | 2001年 / 480卷 / 03期

关键词：

nucleation; growth; low-energy electron microscopy (LEEM); copper;

D O I：

10.1016/S0039-6028(01)00823-8

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The homoepitaxial growth of Cu on Cu(0 0 1) has been investigated with low-energy electron microscopy (LEEM). The temporal evolution of engineered pyramid-like structures has been monitored for a range of incident Cu fluxes and substrate temperatures. The step velocities have been analyzed in the framework of a novel growth model that contains as the only adjustable parameter the height of the Ehrlich-Schwoebel (ES) barrier. The simultaneous description of all step velocities observed within the flux and temperature range covered by our experiments determines the height of the ES barrier to about 125 meV in this system. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：97 / 102

页数：6

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