Comment on "Atomic transport and chemical stability during annealing of ultrathin Al2O3 films on Si" -: Reply

被引:13
作者
Krug, C
da Rosa, EBO
de Almeida, RMC
Morais, J
Baumvol, IJR
Salgado, TDM
Stedile, FC
机构
[1] Univ Fed Rio Grande do Sul, Inst Fis, BR-91509900 Porto Alegre, RS, Brazil
[2] Univ Fed Rio Grande do Sul, Inst Quim, BR-91509900 Porto Alegre, RS, Brazil
关键词
D O I
10.1103/PhysRevLett.86.4714
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
引用
收藏
页码:4714 / 4714
页数:1
相关论文
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