Glancing angle deposition: Fabrication, properties, and applications of micro- and nanostructured thin films

被引:747
作者
Hawkeye, Matthew M. [1 ]
Brett, Michael J.
机构
[1] Univ Alberta, Dept Elect & Comp Engn, Edmonton, AB T6G 2V4, Canada
[2] Natl Res Council Canada, Canada & Natl Inst Nanotechnol, Edmonton, AB T6G 2M9, Canada
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2007年 / 25卷 / 05期
基金
加拿大自然科学与工程研究理事会;
关键词
D O I
10.1116/1.2764082
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Physical vapor deposition under conditions of obliquely incident flux and limited adatom diffusion results in a film with a columnar microstructure. These columns will be oriented toward the vapor source and substrate rotation can be used to sculpt the columns into various morphologies. This is the basis for glancing angle deposition (GLAD), a technique for fabricating porous thin films with engineered structures. The origin of the columnar structure characteristic of GLAD films is discussed in terms of nucleation processes and structure zone models. As deposition continues, the columnar structures are influenced by atomic-scale ballistic shadowing and surface diffusion. Competitive growth is observed where the tallest columns grow at the expense of smaller features. The column shape evolves during growth, and power-law scaling behavior is observed as shown in both experimental results and theoretical simulations. Due to the porous nature of the films and the increased surface area, a variety of chemical applications and sensor device architectures are possible. Because the GLAD process provides precise nanoscale control over,the film structure, characteristics such as the mechanical, magnetic, and optical properties of the deposited film may be engineered for various applications. Depositing onto prepatterned substrates forces the columns to adopt a planar ordering, an important requirement for photonic crystal applications. (c) 2007 American Institute of Physics.
引用
收藏
页码:1317 / 1335
页数:19
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