Dynamics, interactions, and collisions of atomic steps on Si(111) in sublimation

被引：12

作者：

Finnie, P ^{[1
]}

Homma, Y ^{[1
]}

机构：

[1] NTT, Basic Res Labs, Atsugi, Kanagawa 2430198, Japan

来源：

PHYSICAL REVIEW LETTERS | 1999年 / 82卷 / 13期

关键词：

D O I：

10.1103/PhysRevLett.82.2737

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The dynamics of atomic steps and the interactions between them were observed by in situ scanning electron microscopy for the sublimation of a Si(111) surface which was atomically flat on a large (similar to 100 mu m X 50 mu m) scale. Newly nucleated widely spaced steps moved at a constant velocity. For more narrowly spaced steps, diffusion mediated step-step interactions reduced the step velocity. To further probe these interactions, steps were made to collide. In destructive collisions, steps decelerated and flattened. In constructive collisions double atomic steps were produced. [S0031-9007(99)08702-5].

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页码：2737 / 2740

页数：4

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