Micromechanical fabrication of robust low-power metal oxide gas sensors

被引:43
作者
Friedberger, A [1 ]
Kreisl, P
Rose, E
Müller, G
Kühner, G
Wöllenstein, J
Böttner, H
机构
[1] EADS Corp Res Ctr, Microsyst Dept, D-81663 Munich, Germany
[2] Fraunhofer Inst Phys Measurement Tech, D-79110 Freiburg, Germany
来源
SENSORS AND ACTUATORS B-CHEMICAL | 2003年 / 93卷 / 1-3期
关键词
metal oxide; robust gas sensor; low-power; micromachined;
D O I
10.1016/S0925-4005(03)00221-1
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
A fabrication process for miniaturized low-power metal oxide gas sensor arrays is presented. This process, which is based on silicon-on-insulator (Sol) wafers, leads to thermally insulated silicon hot plate structures, which successfully combine low-power consumption with mechanical ruggedness and a high process yield. A second important feature of our process is that it consists of a standard-silicon front-end and a sensor-specific back-end module. This separation into front-end and back-end modules is a prerequisite for an efficient workshare between silicon foundries and SME sensor manufacturers in the industrialization of low-power gas sensor arrays. In the first part of the paper we present an outline of the fabrication flow consisting of the front-end fabrication of micromachined low-power heater platforms and the back-end fabrication of gas-sensitive layers. In the second part we report on the results of extensive mechanical, thermal and gas sensing measurements on such miniaturized devices. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:345 / 349
页数:5
相关论文
共 13 条
[1]   Gas mixture analysis using silicon micro-reactor systems [J].
Becker, T ;
Mühlberger, S ;
Bosch-vonBraunmühl, C ;
Müller, G ;
Meckes, A ;
Benecke, W .
JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 2000, 9 (04) :478-484
[2]  
DUCSO C, 1996, P EUR 10 LEUV BELG, V10, P227
[3]  
Gardner JW, 2001, TRANSDUCERS '01: EUROSENSORS XV, DIGEST OF TECHNICAL PAPERS, VOLS 1 AND 2, P1688
[4]   Gas identification by modulating temperatures of SnO2-based thick film sensors [J].
Heilig, A ;
Barsan, N ;
Weimar, U ;
Schweizer-Berberich, M ;
Gardner, JW ;
Gopel, W .
SENSORS AND ACTUATORS B-CHEMICAL, 1997, 43 (1-3) :45-51
[5]   Field-effect-induced gas sensitivity changes in metal oxides [J].
Hellmich, W ;
Muller, G ;
Bosch-Von Braunmuhl, C ;
Doll, T ;
Eisele, I .
SENSORS AND ACTUATORS B-CHEMICAL, 1997, 43 (1-3) :132-139
[6]   THE KINETICS OF FORMATION OF GAS-SENSITIVE RGTO-SNO2 FILMS [J].
HELLMICH, W ;
BOSCHVONBRAUNMUHL, C ;
MULLER, G ;
SBERVEGLIERI, G ;
BERTI, M ;
PEREGO, C .
THIN SOLID FILMS, 1995, 263 (02) :231-237
[7]  
HELLMICH W, 1995, P E AS C CHEM SENS X
[8]   CONTACT AND SHEET RESISTANCES OF SNO2 THIN-FILMS FROM TRANSMISSION-LINE MODEL MEASUREMENTS [J].
HOEFER, U ;
STEINER, K ;
WAGNER, E .
SENSORS AND ACTUATORS B-CHEMICAL, 1995, 26 (1-3) :59-63
[9]  
JAGLE M, 1998, P EUROSENSORS, V12, P225
[10]   Thick-film gas sensors based on nano-sized semiconducting oxide powders [J].
Martinelli, G ;
Carotta, MC ;
Traversa, E ;
Ghiotti, G .
MRS BULLETIN, 1999, 24 (06) :30-36