The effect of the amorphous insulator layer on conduction behaviors of the silica/indium tin oxide two-layer films

被引：5

作者：

Kim, SW ^{[1
]}

Shin, YW ^{[1
]}

Bae, DS ^{[1
]}

Lee, JH ^{[1
]}

Kim, J ^{[1
]}

Lee, HW ^{[1
]}

机构：

[1] Korea Inst Sci & Technol, Nanomat Res Ctr, Seoul 136791, South Korea

来源：

THIN SOLID FILMS | 2003年 / 437卷 / 1-2期

关键词：

silicon oxide; indium tin oxide; conductivity; additive;

D O I：

10.1016/S0040-6090(03)00681-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The effect of the amorphous insulator layer on conduction behavior of spin coated silica/sputtered indium tin oxide two-layer film was studied in terms of impedance spectroscopy measurements, and current-voltage characterizatics. I-V characteristics of the two-layer films have shown that the conduction mechanism changes from direct tunneling to space-charge-limited conduction, when zinc cations are added to the silica layer. An addition of the ionic dopant leads to a large decrease in sheet resistance of the two-layer film as shown in the Cole-Cole plot. Consequently, the conductivity enhancement of the two-layer film without a reduction in transparency was achieved by the introduction of zinc cations into the amorphous silica layer. (C) 2003 Elsevier Science B.V. All rights reserved.

引用

页码：242 / 247

页数：6

共 32 条

[1]

ADACHI K, 1998, Patent No. 5853869

[2] Pulsed laser deposition of crystalline indium tin oxide films at room temperature by substrate laser irradiation [J].

Adurodija, FO ;

Izumi, H ;

Ishihara, T ;

Yoshioka, H ;

Motoyama, M ;

Murai, K .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 2000, 39 (4B) :L377-L379

[3] LOCALIZED CONDUCTION IN DIELECTRIC FILMS [J].

ALBIN, S .

THIN SOLID FILMS, 1981, 86 (04) :369-376

[4] METEORITES AND EARLY SOLAR SYSTEM [J].

ANDERS, E .

ANNUAL REVIEW OF ASTRONOMY AND ASTROPHYSICS, 1971, 9 :1-&

[5] Space-charge limited conduction with a field and temperature dependent mobility in Alq light-emitting devices [J].

Brütting, W ;

Berleb, S ;

Mückl, AG .

SYNTHETIC METALS, 2001, 122 (01) :99-104

[6] Optimization of sputtered ITO films with respect to the oxygen partial pressure and substrate temperature [J].

Carl, K ;

Schmitt, H ;

Friedrich, I .

THIN SOLID FILMS, 1997, 295 (1-2) :151-155

[7] TRANSPARENT CONDUCTORS - A STATUS REVIEW [J].

CHOPRA, KL ;

MAJOR, S ;

PANDYA, DK .

THIN SOLID FILMS, 1983, 102 (01) :1-46

[8]

CRONIN JP, Patent No. 5900275

[9] Space-charge-limited current, trap distribution and optical energy gap in amorphous (ln13Se87 and In20Se80) thin films [J].

El-Sayed, SM .

VACUUM, 2002, 65 (02) :177-184

[10] SPACE-CHARGE-LIMITED CONDUCTION IN RF-SPUTTERED PURE AND VANADIUM-DOPED AMORPHOUS SIO2-FILMS [J].

EZE, FC .

THIN SOLID FILMS, 1986, 145 (02) :161-170

← 1 2 3 4 →