Zn solubility limit in GaAs: Growth versus equilibrium

被引:5
作者
Chen, CY [1 ]
Cohen, RM [1 ]
机构
[1] UNIV UTAH,DEPT MAT SCI & ENGN,SALT LAKE CITY,UT 84112
基金
美国国家科学基金会;
关键词
D O I
10.1016/0022-0248(96)00203-5
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We have found that the equilibrium Zn solubility Limit in GaAs, as set by formation of the second condensed phase, Zn3As2, exhibits a retrograde behavior over the temperature range 575 less than or equal to T less than or equal to 700 degrees C, at constant arsenic partial pressure. The results show that the maximum Zn concentration, N-Zn, which can be grown into GaAs by organometallic vapor phase epitaxy is limited by the equilibrium solid solubility limit. Below the solid solubility limit, we observe N-Zn similar to P-Zn for rapid growth rates, r(g) > 1.6 mu m/h. We demonstrate a clear transition to the expected equilibrium relationship, N-Zn similar to P-Zn(1/2), at lower growth rates. Both results are shown to be consistent with Fermi energy pinning at the surface at high temperatures. The equilibrium constant and the enthalpy of the formation of Zn3As2 have been estimated from the growth of Zn3As2 at several temperatures and compared to the results of others.
引用
收藏
页码:17 / 23
页数:7
相关论文
共 15 条
[1]  
Barin I.P.D., 1989, Thermochemical Data of Pure Substances
[2]   Vapour pressure measurements of high boiling point metals [J].
Baur, E ;
Brunner, R .
HELVETICA CHIMICA ACTA, 1934, 17 :958-969
[3]  
Casey H. C. Jr., 1972, Journal of Crystal Growth, V13-14, P818, DOI 10.1016/0022-0248(72)90566-0
[4]  
CASEY HC, 1968, T METALL SOC AIME, V242, P406
[5]   INVESTIGATION OF ZINC INCORPORATION IN GAAS EPILAYERS GROWN BY LOW-PRESSURE METALORGANIC CHEMICAL-VAPOR DEPOSITION [J].
CHANG, CY ;
CHEN, LP ;
WU, CH .
JOURNAL OF APPLIED PHYSICS, 1987, 61 (05) :1860-1863
[6]   DIFFUSION-LIMITED ETCHING OF P-GAAS IN NAOH-NA2EDTA SOLUTIONS [J].
CHEN, CY ;
REICHERT, W ;
COHEN, RM .
MATERIALS LETTERS, 1994, 19 (3-4) :109-113
[7]   ZINC DOPING OF MOCVD GAAS [J].
GLEW, RW .
JOURNAL OF CRYSTAL GROWTH, 1984, 68 (01) :44-47
[8]   PRESSURE AND TEMPERATURE-DEPENDENCE OF ZN INCORPORATION IN METALORGANIC CHEMICAL VAPOR-DEPOSITION GROWN GAAS AND ALGAAS USING DIETHYLZINC AS PRECURSOR [J].
HAGEMAN, PR ;
DECROON, MHJM ;
TANG, X ;
GILING, LJ .
JOURNAL OF CRYSTAL GROWTH, 1993, 129 (1-2) :281-288
[9]   SOME THERMODYNAMIC PROPERTIES OF ZN3AS2, CD3AS2, AND ZNP2 [J].
JORDAN, AS .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (08) :1362-&
[10]  
MUNIR ZA, 1976, HIGH TEMP SCI, V6, P73