The effects of thermal annealing on the relaxation of rubbing-induced birefringence in polystyrene

被引:3
作者
Shiu, KP [1 ]
Qin, ZY [1 ]
Yang, Z [1 ]
机构
[1] Hong Kong Univ Sci & Technol, Dept Phys, Kowloon, Hong Kong, Peoples R China
关键词
D O I
10.1140/epje/i2004-10136-7
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We have conducted a systematic study on the effects of post rubbing annealing on the relaxation of rubbing-induced birefringence of polystyrene. It is found that annealing at T-o only affects the relaxation up to T-o + T-Lag, where T-Lag is proportional to the logarithm of the annealing time t(A). A theoretical model based on the distribution of relaxation times due to the individual refringence elements is proposed. To remove its contribution to the net birefringence each element must overcome an energy barrier E = (317 + 1.17 xi) X 10(3) J/mol, and therefore must have a characteristic relaxation time tau which depends on temperature T and a barrier height which ranges from 340.4 kJ/mol to 445.7 kJ/mol. The relaxation of birefringence is expressed by the equation NB(T,t) = integral(infinity)(o) N(xi)e(-t/tau(T,xi))d xi, in which both the relaxation time tau(T,xi) and the distribution function N(xi) can be extracted from experimental data. The predictions of the model agree well with all the experimental results presented in this work. The differences and similarities of the relaxation of birefringence with respect to the physical aging of quenched PS are discussed. In particular, similarities in terms of the general temperature lag phenomena are noted.
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页码:139 / 147
页数:9
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